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Advanced Energy Technology Group Seminar Series


6 November 2003
10:00 AM
479 EBU-II, UC San Diego

Laser Produced Plasma Sources for EUV Lithography

S. S. Harilal

ABSTRACT:

EUV lithography is considered an attractive candidate to succeed conventional optical lithography in the coming years. Laser produced plasma is one of the most promising sources to be used with EUV lithography. There are several key factors that affect the selection of the target for the source. A review of the recent advances in EUV source for the next generation lithography will be presented.

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