Published Work:
I. Journal Articles
 39.
Y. Tao, M.S.Tillack, K.L.Sequoia, R.A.Russel,
S.Yuspeh, and F.Najmabadi.
Efficient 13.5 nm extreme ultraviolet emission from Sn plasma
irradiated by a long CO2 laser pulse.
Appl.Phys.Lett, 92, 251501 (2008)
(Full text in PDF)
38.
K. L. Sequoia,a Y. Tao, S. Yuspeh, R. Burdt, and M. S. Tillack
Two dimensional expansion effects on angular distribution of 13.5 nm
in-band extreme ultraviolet emission from laser-produced Sn plasma.
Appl.Phys.Lett.,92, 221505 (2008)
(Full text in PDF)
37.
M.S.Tillack, K.L.Sequoia, and Y. Tao.
Geometric effects on EUV emissions in spherical and planar targets.
J. Phys.: Conf. Ser. 112, 042060 (2008)
(Full text in PDF)
36.
Y. Tao, M.S.Tillack, S.S.Harilal, K.L.Sequoia, R.A.Russel, and F.Najmabadi.
Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source.
Optics
Letter, 39, 1339 (2007) (Full text in PDF)
35.
Y. Tao, M.S.Tillack, S.S.Harilal, K.L.Sequoia, and F.Najmabadi.
Investigations on interaction of a laser
pulse with a pre-formed Gaussian Sn plume for an extreme ultraviolet lithography source.
J. Appl. Phys., 101, 023305 (2007) (Full text in PDF)
34.
S.S.Harilal, B. O'Shay, Y. Tao, and M.S.Tillack.
Ion debris mitigation from
tin plasma using ambient gas, magnetic fielda nnd combined effects. Sn plume for an extreme ultraviolet lithography source.
Appl. Phys.B,86,547 (2007) (Full Text in PDF)
33.
Y. Tao, and M.S.Tillack.
Mitigation of fast ions from
laser-produced Sn plasma for an extreme ultraviolet lithography source.
Appl.Phys.Lett., 89,111501(2006) (Full
Text in PDF)
32.
Y. Tao, S.S.Harilal, M.S.Tillack, K.L.Sequoia, B. O'Shay, and F. Najmabadi.
Effect of focal spot size on in-band 13.5 nm extreme ultraviolet emission from laser-produced Sn
plasma.
Opt.Lett., 31,2492 (2006).(Full Text in PDF)
31.
Y.Tao, M.S.Tillack, S.S.Harilal, K.L.Sequoia, B.O'Shay, and F.Najmabadi.
Effect of shockwave-induced density jump on laser plasma interactions in low-pressure ambient air.
J.Phys.D:Appl.Phys. 39,4027 (2006)(Full Text in PDF)
30.
H. Nishimura, S. Fujioka, T. Okuno, Y. Tao, N. Ueda, T. Ando, T. Aota, Y. Yasuda, S. Uchida, Y. Shimada, M. Yamaura, K. Hashimoto, Q. Gu, K. Nagai, Y.
Norimatsu, H. Furukawa, Y.G. Kang, A. Sunahara, K. Gamada, M. Murakami, K. Nishihara, N. Miyanaga, Y. Izawa and K. Mima.
EUV and particle generations from laser-irradiated solid- and low-density
targets.
J. Phys. IV France, 133, 1189(2006).(Full Text in PDF)
29.
Y. Izawa, N. Miyanaga, H. Nishimura, S. Fujioka, T. Aota, Y. Tao, S. Uchida, Y. Shimada, K. Hashimoto, M. Yamaura, K. Nishihara, M. Murakami, A. Sunahara, H.
Furukawa, A. Sasaki, W. Nishikawa, H. Tanuma, T. Norimatsu, K. Nagai, Q. Gu, M. Nakatsuka, H. Fujita, K. Tsubakimoto, H. Yoshida and K. Mima.
Development of EUV light source by laser-produced plasma.
J. Phys. IV France, 133, 1161(2006).(Full Text in PDF)
28.
T. Okuno,. H. Nishimura, S. Fujioka, Y. Tao, T. Hibino, R. Matsui, Q. Gu, K. Nagai, T. Norimatsu, K. Nishihara, N. Miyanaga, and Y.
Izawa.
Control of EUV spectral shape by the use of low-density SnO2 targets.
Appl.Phys.Lett., 88, 161501(2006).(Pre-print in PDF)
27.
Keiji Nagai, QinCui Gu, ZhongZe Gu, Tomoharu Okuno, Shinsuke Fujioka, Hiroaki Nishimura, YeZheng Tao, Yuzuri Yasuda, Mitsuo Nakai, Takayoshi Norimatsu, Yoshinori Shimada, Michiteru
Yamaura, Hidetsugu Yoshida, Masahiro Nakatsuka, Noriaki Miyanaga, Katsunobu Nishihara, and Yasukazu Izawa. Angular distribution control of extreme ultraviolet
radiation from laser-produced plasma by manipulating the nanostructure of low-density SnO2 targets.
Appl. Phys. Lett. 88, 094102 (2006).(Full Text in PDF)
26.
S. S. Harilal, Beau O'Shay, Yezheng Tao and Mark S. Tillack.
Ambient gas effects on the dynamics of
laser-produced tin plume expansion,
Journal of Applied Physics 99,083303 (2006). (Full Text in PDF).
25.
S. S. Harilal, M. S. Tillack, Y. Tao, B. O'Shay, R. Paguio and A. Nikroo,
Extreme ultraviolet spectral purity and magnetic ion debris mitigation with low density tin targets,"
Optics Letters, 31, 1549 (2006)(Full Text in PDF).
24.
S. S. Harilal, J. O'Shay, M. S. Tillack, Y. Tao, R. Paguio, A. Nikroo and C. A. Back,
"Spectral control of emissions from Sn-doped targets for EUV lithography,"
J. Phys. D: Applied Physics 39
484, (2006)(Full Text in PDF).
23.
Shinsuke Fujioka, Hiroaki Nishimura, Katsunobu Nishihara, Akira Sasaki, Atsushi Sunahara, Tomoharu Okuno,Nobuyoshi Ueda, Tsuyoshi Ando, Yezheng Tao, Yoshinori Shimada, Kazuhisa
Hashimoto, Michiteru Yamaura, Keisuke Shigemori, Mitsuo Nakai, Keiji Nagai, Takayoshi Norimatsu, Takeshi Nishikawa, Noriaki Miyanaga,Yasukazu Izawa, and Kunioki Mima.
Opacity Effect on Extreme Ultraviolet
Radiation from Laser-Produced Tin Plasmas.
Phys.Rev.Lett. 95, 235004 (2005)(Full Text in PDF).
22.
Y. Tao, H.Nishimura, S.Fujioka, T.Okuno, N.Ueda, M.Nakai, K. Nagai, T.Norimatsu, K.Nishihara, N. Miyanaga, and Y. Izawa.
Dynamic imaging of extreme ultraviolet
emission in laser-produced Sn plasmas.
Appl.Phys.Lett. 87, 241502 (2005)(Full Text in PDF).
21.
Y.Tao, H.Nishimura, S.Fujioka. A.Sunahara, M.Nakai, T.Okuno, N.Ueda, K.Nishihara, N. Miyanaga, and Y. Izawa.
Characterization of electron density profile
of laser-produced Sn plasma for 13.5nm extreme ultraviolet source.
Appl.Phys.Lett., 86, 201501 (2005)(Full Text in
PDF).
20.
Y. Shimada, H. Nishimura, M. Nakai, K. Hashimoto, M. Yamaura, Y. Tao, K. Shigemori, T. Okuno, K. Nishihara , T. Kawamura , A. Sunahara , S. Fujioka, S. Uchida, N. Miyanaga, Y. Izawa
and C. Yamanaka.
Characterization of EUV emission from laser
produced spherical tin plasma generated with multiple laser beams.
Appl.Phys.Lett. 86, 051501(2005)(Full Text in PDF).
19.
Y.Tao, M.Nakai, H.Nishimura, S.Fujioka, T.Okuno, T.Fujiwara, N.Ueda, N.Miyanaga, and Y.Izawa.
A temporally-resolved Schwarzschild
microscope for characterization of extreme ultraviolet in laser-produced plasmas.
Rev.Sci.Instrum. 75, 5173 (2004)(Full Text in
PDF).
Also on Virtual Journal of Ultrafast Science. Jan., 2005. http://www.vjultrafast.org
18.
Y. Tao, S. Farshad, H. Nishimura, R. Matsui, T. Hibino, T. Okuno, S. Fujioka, K. Nagai, T. Norimatsu, K. Nishihara, N. Miyanaga, and Y. Izawa, A.Sunahara and T.Kawamura.
Monochromatic imaging and angular
distribution measurements of extreme ultraviolet light from laser-produced Sn and SnO2 plasmas.
Appl.Phys.Lett. 85, 1919(2004)(Full Text in PDF)
Also on Virtual Journal of Ultrafast Science. Oct., 2004. http://www.vjultrafast.org
17.
K. Nagai, H. Nishimura, T. Okuno, T. Hibino, R. Matsui, Y.-Z. Tao, M. Nakai, T. Norimatsu, N. Miyanaga, K. Nishihara, and Y. Izawa, Trans. Mater. Res. Soc. Jpn. 29, 943
(2004).
16.
TAO Ye-Zheng, LI Ye-Jun, TANG Xiu-Zhang, ZHANG Hai-Feng, SHAN Yu-Sheng, WANG Nai-Yan,
Generation of Hot electron with higher temperature from femtosecond laser-solid plasma,
Chinese Phyiscs Letter, 19(7), 956, 2002.(Full Text in PDF)
15.
Y. Z. Tao, N.Y.Wang, Y.S.Shan, Y.J.Li, X.Z.Tang, and H.F.Zhang,
The hard X-ray continuum from intense ultrashort KrF laser-solid interaction,
Laser and Particle Beams 20(1),129,2002.(Full Text in PDF)
14.
Naiyan Wang, Yusheng Shan, Weiyi Ma, Dawei Yang, Kun Gong, Xiaojun Wang, Jinglong Ma, Xiuzhang Tang, Tao Yezheng,and Xingdong Jiang,"
"Activities of developing high-power KrF lasers and studying laser plasmas interaction physics at CIAE,"
Laser and Particle Beams 20(1),119, 2002.(Full Text in PDF)
13.
Yusheng Shan, Naiyan Wang, Jinglong Ma, Weiyi Ma, Dawei Yang, Xiaojun Wang, Xingdong Jang, Kun Gong, Xiuzhang Tang and Yezheng Tao,
"A six beams high Power KrF excimer Laser System with energy of 100J/23ns,"
Laser and Particle Beams 20(1),123,2002.(Full Text in PDF)
12.
Nishimura , ... Y.Tao, et al.
Characterization of extreme ultraviolet radiation from laser produced spherical Tin plasma for use in lithography.
J. Plasma Fusion Res.80,325,(2004).(in Japanese)
11.
Li Yejun, Tao Yezheng, Cheng Youjian, Shan Yusheng, Zhang Haifeng.
Development and Calibration of Hot Electron Magnetic Spectrometer.
Atomic Energy Science and Tech. 39, 252 (2005). (in Chinese)
10.
25. TANG XiuZhang ; ZHANG Haifeng ; LI Jing; TAO Ye zheng; SHAN Yusheng; WANG Naiyan; Simon Peter; Satmari Sandor.
50mJ table-top shortpulse KrF laser system.
High Power Laser & Particle Beams. 14, 707, (2002).
9.
Tao Yezheng, Li Yejun, Tang Xiuzhang, Zhang Haifeng, Shan Yusheng and Wang Naiyan,
Influence of ponder-motive force to interaction of ultrashort pulse laser with solid plasma,
High Power Laser and Particle Beams. 14(5),720,2002 (in Chinese)
8.
Tao Yezheng, Li Yejun, Shan Yusheng and Wang Naiyan,
"Generation of hard x-ray and hot electron from UV high intensity ultrashort pulse laser solid plasma,"
High Power Laser and Particle Beams.14(3), 377, 2002 (in Chinese)
7.
TAO Ye-Zheng, SHAN Yu-Sheng, LI Ye-Jun, TANG Xiu-Zhang, ZHANG Hai-Feng, WANG Nai-Yan,
"Study of hot electron generation from solid target irradiated by ultrashort laser,"
Atomic Energy Science and Tech. 2002,36(6),481 (in Chinese)
6.
Tang Xiu-zhang, Zhang Hai-feng, Li jing, TAO Ye-zheng, SHAN Yu-sheng, WANG Nai-yan,
High power UV ultrashort pulse laser[J].
Atomic Energy Science and Technology, 2002,36(2):112-116. (in Chinese)
5.
TAO Ye-zheng, WANG Nai-yan, SHAN Yu-sheng et al,
"Measuring ultrafast X-ray spectrum by single-photon incident method,"
Atomic Energy Science and Tech. 36(1), 52,2002 (in Chinese)
4.
Shan Yusheng, Wang Naiyan, Ma Jinglong, Tao Yezheng, Tang Xiuzhang, Ma Weiyi, Wang Xiaojun, Gong Kun, Yang Dawei, Jing Xingdong, Gao Huailin, and Feng Qi.
Chinese J. Laser. 1, 193 (2002). (in Chinese)
3.
Shan Yusheng, ¡ Tao Yezheng, et al.
Six-beam multiplexing high power KrF laser system.
Progress of laser and photo-electronic. 9,16(2001).(in Chinese)
2.
Tao Yezheng, Lu Ze, Zhang Fengruan, Shan Yusheng, and Wang Naiyan,
The design and debug of the auto-control and data acquisition system for Heaven-I facility,
Atomic Energy Science and Tech., 33(2),120,1999 (in Chinese)
1.
Tao Yezheng and Shan Yusheng.
Compression KrF excimer laser pulse width using saturable absorber.
Chinese J. Laser, 24(2),100, 1997(in Chinese)
II. Selected conference presentations
11.
(Invited) Y. Tao, M. S. Tillack, K. L. Sequoia, R. A. Burdt,
and S.Yupeh.
Fundamental investigation on CO2 laser-produced Sn plasma for an EUVL
source.International Workshop on EUV Lithography. Maui, Hawaii, USA.
June 10-12, 2008.
10.
Y. Tao, M. S. Tillack, K. L. Sequoia, R. A. Burdt, and F. Najmabadi.
Dynamics of laser-produced Sn-based plasmas for a monochromatic 13.5 nm extreme ultraviolet source. Proc. SPIE 6703, 67030A (2007)(Full text)
9.
Y. Tao, M. S. Tillack, K. L. Sequoia, and F. Najimabadi. A mass-limited Sn target irradiated by dual laser pulses for an EUVL source, SPIE Advanced Lithography,
San Jose. Feb.25-Mar.2, 2007. Proc. of SPIE, 6517, 65173Q1-10 (2007). (Full text)
8.
Y.Tao and M.S.Tillack.
Mitigation fast particles from laser-produced Sn plasma for an extreme ultraviolet lithography source.
EUV Source Workshop. San Diego, May 25,2006.
7.
Y.Tao, H.Nishimura, M.Nakai, et al.
Density measurement of extreme ultraviolet emission region in laser-produced Sn plasmas.
3rd International EUVL symposium, Nov.1-4, 2004. Miyazaki, Japan. SoP30.
http://www.sematech.org/resources/litho/meetings/euvl/20041101euvl/posters.htm
6
Y.Tao et al.
Experimental researches on laser produced EUV light plasmas for lithography.
4th Japan-US Workshop on High Irradiance Laser and Plasma Diagnostic. Nov.29-Dec.1, 2004. Osaka, Japan.
5.
Y. Z. Tao, Y.J.Li, X.Z.Tang, H.F.Zhang, Y.S.Shan, and N.Y.Wang,
"Studying intense ultrashort laser plasmas interaction related with Fast Ignition of laser fusion,"
International Youth Nuclear Conference 2002, April 17-20,2002, Dajeon,
Korea.
4.
Y. Z.Tao, Y.J.Li, X.Z.Tang, H.F.Zhang, Y.S.Shan, and N.Y.Wang,
"Hot electron generated by UV ultrashort pulse laser,"
China-German Symposium on High-Intensity-Laser in Shanghai, Sept. 16-19, 2002. Shanghai,China.
3.
Yezheng Tao, et al.
Hard X-ray generation from moderate intensity fs laser-solid plasmas. 5th Workshop on Fast Ignition of Fusion Targets,
18-22 June,2001, Maderia, Portugal.
2.
Yezheng Tao, Yusheng Shan, Naiyan Wang, Yejun Li,, Xiuzhang Tang, and Haifeng Zhang.
Intense ultrashort laser plasmas researches at CIAE.
Workshop on China-Germany collaboration for ultraintense KrF laser. April 30, 2001, Gottingen,
Germany.
1.
Tao Yezheng and Shan Yusheng.
Developing of KrF excimer laser technology used to ICF.
Asia Science Seminar on High-Power Laser Matter Interactions. 7-17 February, 1999, Osaka, Japan. (Poster)
III.
Patents
2.
Yezheng Tao and Mark Tillack. System and Method for Light Source
Employing Laser-Produced Plasma. U.S. Provisional Application Serial
No. _61/052,857. 2008.
1.
Yezheng Tao and Mark Tillack.
IMPROVED LIGHT SOURCE EMPLOYING LASER-PRODUCED PLASMA. USA
(WO/2007/121142) and international patents (PCT/US2007/06624). 2007.
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